Aerosol Deposition Technology

Introduction

Aerosol Deposition is an efficient and versatile coating method that produces high-quality, dense films at room temperature. The aerosol is directed through a nozzle, where the particles are accelerated to high velocity up to 500 m/s. When high-velocity particles impact on substrates, the materials undergo plastic deformation, causing them to adhere tightly to the surface. This high-energy collision results in the particles interlocking and bonding, forming a dense and uniform film. It is able to coat a wide range of materials and substrates, combined with its energy efficiency and superior coating quality, makes it a valuable technique in advanced manufacturing across various industries.


Excellent Coating Properties

  • No Substrate / Powders Heating (~25°C)

  • No Intermediate Layer

  • Dense Coating

  • Controllable Film Thickness (0.5~100µm)


Benchmark of Coating Processes

-- APS PVD / CVD AD
Deposition Rate (µm /min) > 50 0.01 ~ 0.1 1 ~ 10
Thickness. max > 300µm ~ 20µm ~ 100µm
Process Temperature (°C) ~ 2000°C RT ~ 1000°C Room Temp
Material Metal / Ceramic Metal / Ceramic No limitation
2D / 3D coating 3D 2D 2D→3D
Film quality Low High High
Film Cross section

Flexible Application of AD Technology

Application Examples

  • Anti-plasma erosion coating (TPC windows)

  • Wear resistant coating

  • Thermal barrier for turbine blade

  • Ceramic coating (ZeO2 / AI2O3 / HA) on metallic implants

  • ASSB (All-Solid-State-Battery) electrolytes / cathodes